Join us to learn more about iNEMI’s mmWave Permittivity Reference Material Development project, which is currently in sign-up. The goal of this new project is to develop and characterize suitable reference material(s) for consistent Df/Dk measurement methodologies to characterize ultra-low loss laminate materials in the range of 30–100GHz. Next-generation 5G/6G solutions require ultra low loss laminate materials and PCBs/substrates for efficient design of communications equipment. iNEMI’s recently completed 5G/mmWave Materials Assessment and Characterization project identified the need for standardized measurement methods — specifically, an urgent need for development of reference materials that can be used reliably for low loss material measurements utilizing commercially available tools. The mmWave Permittivity Reference Material Development project, led by co-chairs Michael J. Hill (Intel) and Nathan Orloff (NIST), will address this need as follows:
- Identify candidate material(s)
- Develop methodology of characterization and validation at NIST using on-wafer techniques and other metrology
- Validate across industry partners/project participants